Benchtop Plasma Cleaner for Large Devices / Batch Sizes: PE-200

PE-200 Key Features

Available in Plasma Clean, Etch and RIE configurationsConvertible option: Isotropic and anisotropic processing in a single systemThree large process shelves 325mm (13") wide x 400 (16") x 75mm (3?)Custom chamber and shelf configurationsShelf temperature control optionPC control provides enhanced consistency and performanceMFC gas flow control for optimal process control

The PE-200 is an industrial strength bench top plasma etching system supplied with an oxygen service vacuum pump. This robust, reliable and yet quite affordable system was developed for the busy 24/7 manufacturing firm that cannot have downtime.

The PE-200 vacuum chamber encloses a generous 3225cm� (500 square inches) of active plasma processing surface, providing increased bond strength and cleanliness of almost any surface material. Etching with our plasma cleaner rather than with chemical baths can also eliminate expensive hazardous chemical waste.

The system is often purchased by small-medium volume production facilities, research and development labs, testing facilities and universities. Industry users include Biomedical, Dental, Electronics, Light Industrial, Medical, Plastics, Optical, Edge Isolation Etch for Solar Cell, and Solar Panel to name a few.

The simple to use, intuitive touch screen interface controls every aspect of the plasma process ensuring repeatability, an optional Windows based control software is also available.

PE-200 features include:

Welded Aluminium Vacuum ChamberThree 325mm (13") wide x 400 (16") deep electrode shelvesElectrode horizontal shelves on 3" spacing300 Watt RF generator @ 13.56 MHzAutomatic Matching NetworkOne 200 SCCM Mass Flow ControllerPirini Vacuum Gauge. Range 0-1 TorrMicroprocessor Control System with Touch Screen20 Recipe storage (Unlimited with Windows option)29 CFM Oxygen service Vacuum pump3 Microns Vacuum Pump Oil FiltrationPlasma Console 900 x 900 x 800mm (36x36x32")System Weight 159Kg (350lbs)Vacuum Pump 400 x 800 x 500mm (16x32x20")Vacuum Pump Weight 82Kg (180lbs)Compressed Air Service 80-100 PSI <0.5 CFMRegulated Process Gases 15-30 PSI

Optional System Features:

Electrostatic Shielding | Process Temperature Control600 W RF Generator @ 13.56MHz (A.M.N)59 CFM Vacuum oxygen service pump (3 phase)Automatic 2 point N2 purge systemSignal Light TowerMKS Automatic Throttle Vacuum Controller2 additional Mass Flow Controllers (total of 3)Software selectable 5 gas input steering matrixControlled Rate N2 Chamber PurgeOil Mist Coalescing Filter on Vac Pump exhaustCustom Chamber size and configurationCustom Electrode Size and configurationRIE (reactive ion electrode) configurationWindows Operating Software & Recipe Storage

Facility Optional:

Packed Bed Fume ScrubberCompressed Air Dryer for vacuum pump Purge Gas supply

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PE-200 Technical Downloads

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PE-200 Datasheet

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