Production Sputtering

SVS offers a wide range of sputtering equipment for production facilities.

The V2000 series can be designed for the following sputtering configurations:

Sideways (V2000)
Sputter down (V2400)
Sputter up (V2600)
Single loadlock sputter system (V2800)
Inline double loadlock sputter system (V2900)

Each system is individually designed around the needs of the end user. The systems take advantage of the latest technology, with a wide range of available options:

Wet/Dry 1st stage pumping (application dependent)
Turbo or Cryo pumps for high vacuum stages
DC (straight & pulsed) & RF magnetrons for high uniformity & usage coating
Wide range of substrate holding & heating
High accuracy gas-admittance system (for refractory & reactive sputtering).
Ion assisted deposition
Substrate etch & bias (RF/DC)